AI Article Synopsis
- The study presents a novel lithographic process that creates 3D nanostructures using a single layer of hydrogen silsesquioxane (HSQ) resist.
- It employs low-energy and high-voltage electron beams to form unique mushroom-shaped and freestanding HSQ structures, allowing for precise metallic layer deposition.
- The resulting silver nanostructures demonstrate improved optical properties and reliability in manufacturing compared to traditional planar designs, including notable enhancements in optical transmission.
Article Abstract
We report a bilayer-like electron-beam lithographic process to obtain three-dimensional (3D) nanostructures by using only a single hydrogen silsesquioxane (HSQ) resist layer. The process utilizes the short penetration depth of low-energy (1.5 keV) electron irradiation to first obtain a partially cross-linked HSQ top layer and then uses a high-voltage electron beam (30 keV) to obtain self-aligned undercut (e.g. mushroom-shaped) and freestanding HSQ nanostructures. Based on the well-defined 3D resist patterns, 3D metallic nanostructures were directly fabricated with high fidelity by just depositing a metallic layer. As an example, Ag-coated mushroom-shaped nanostructures were fabricated, which showed lower plasmon resonance damping compared to their planar counterparts. In addition, the undercut 3D nanostructures also enable more reliable lift-off in comparison with the planar nanostructures, with which high-quality silver nanohole arrays were fabricated which show distinct and extraordinary optical transmission in the visible range.
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| http://dx.doi.org/10.1088/0957-4484/27/25/254002 | DOI Listing |
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