This paper introduces a unique method to fabricate free-form symmetrical three-dimensional single-mode waveguides embedded in a newly developed photopolymer. The fabrication process requires only one layer of a single material by combining two-photon lithography and external monomer diffusion resulting in a high refractive index contrast of 0.013. The cured material exhibits high chemical and thermal stability. Transmission loss of 0.37 dB/cm at 850 nm is achieved. Due to the fact that waveguide arrays are produced with high density, this technique could pave the way for three-dimensional optical interconnects at the board level with high complexity and bandwidth density.
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