Using first-principles density functional theory (DFT) hybrid functional calculations, we demonstrate the formation of a quantum spin Hall (QSH) state on a Ge(111) surface. We show that a 1/3 monolayer (ML) Cl-covered Ge(111) surface offers an ideal template for metal, such as Bi, deposition into a stable hexagonal overlayer 2D lattice, which we refer to as Bi@Cl-Ge(111). The band structure and band topology of Bi@Cl-Ge(111) are analyzed with respect to the effect of spin-orbit coupling (SOC). The Bi@Cl-Ge(111) exhibits a QSH state with a band gap of 0.54 eV. In contrast, the Au@Cl-Ge(111) is found to be a trivial semiconducting surface. The Ge(111) substrate acts as an orbital filter to critically select the orbital composition around the Fermi level. Our findings offer another possible system for experimental exploration of the growth of 2D topological materials on conventional semiconductor substrates, where the 2D overlayer is atomically bonded to, but electronically decoupled from, the underlying substrate, exhibiting an isolated topological quantum state inside the substrate band gap.
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http://dx.doi.org/10.1088/0957-4484/27/9/095703 | DOI Listing |
RSC Adv
August 2024
Department of Materials Science and Engineering, University of Wisconsin-Madison Madison Wisconsin 53706 USA
The growth of hexagonal boron nitride (hBN) directly onto semiconducting substrates, like Ge and Ge on Si, promises to advance the integration of hBN into microelectronics. However, a detailed understanding of the growth and characteristics of hBN islands and monolayers on these substrates is lacking. Here, we present the growth of hBN on Ge and Ge epilayers on Si high-vacuum chemical vapor deposition from borazine and study the effects of Ge sublimation, surface orientation, and vicinality on the shape and alignment of hBN islands.
View Article and Find Full Text PDFJ Chem Phys
June 2024
Department of Materials Engineering, Federal University of São Carlos, 13.565-905 São Carlos, SP, Brazil.
Crystal surfaces play a pivotal role in governing various significant processes, such as adsorption, nucleation, wetting, friction, and wear. A fundamental property that influences these processes is the surface free energy, γ. We have directly calculated γ(T) for low-index faces of Lennard-Jones (LJ), germanium, and silicon crystals along their sublimation lines using the computational cleavage technique.
View Article and Find Full Text PDFSci Rep
March 2024
Electronic Materials Growth and Interface Characterisation (ƐMaGIC) Lab, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore, 117551, Singapore.
We investigate, through XPS and AFM, the pseudo layer-by-layer growth of Ge native oxide across Ge(001), (110) and (111) surfaces in ambient environment. More significantly, our study reveals a universal set of valence and conduction band offset (VBO and CBO) values observed for Ge(001), Ge(110), and Ge(111) surfaces as a function of Ge-oxide concentration. We find that the band offsets appear to be the same across these low-index Ge surfaces i.
View Article and Find Full Text PDFACS Appl Mater Interfaces
December 2023
Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.
We use epitaxial lateral overgrowth (ELO) to produce semimetallic graphene nanostructures embedded in a semiconducting GaAs matrix for potential applications in plasmonics, THz generation and detection, and tunnel junctions in multijunction solar cells. We show that (1) the combination of low sticking coefficient and fast surface diffusion on graphene enhances nucleation selectivity at exposed regions of the substrate and (2) high growth temperatures favor efficient lateral overgrowth, coalescence, and planarization of epitaxial GaAs films over the graphene nanostructures. Our work provides a more complete understanding of ELO using graphene masks, as opposed to more conventional dielectric masks, and enables new types of metal/semiconductor nanocomposites.
View Article and Find Full Text PDFNanomaterials (Basel)
December 2021
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia.
Three-layer iron-rich FeSi/Ge/FeSi (0.2 < < 0.64) heterostructures on a Si(111) surface with Ge thicknesses of 4 nm and 7 nm were grown by molecular beam epitaxy.
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