Here, we present a new method that utilises shadow masks in a broad ion beam system to prepare atom probe samples. It is particularly suited to non-conductors and materials with surface layers such as surface oxides, implanted layers or thin films. This new approach bypasses the focused ion beam (FIB) lift-out step, increasing the sample throughput, dramatically reducing the required FIB beam time and decreasing the complexity of sample preparation.
Download full-text PDF |
Source |
|---|---|
| http://dx.doi.org/10.1016/j.ultramic.2015.09.005 | DOI Listing |
Publication Analysis
Top Keywords
atom probe
8
sample preparation
8
shadow masks
8
ion beam
8
simple approach
4
approach atom
4
probe sample
4
preparation shadow
4
masks method
4
method utilises
4
Similar Publications
Want AI Summaries of new PubMed Abstracts delivered to your In-box?
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!