We demonstrate a stable and strong n-type doping method to tune the electrical properties of graphene via vapor phase chemical doping with various high-molecular-weight ethylene amines. The resulting carrier concentration after doping with pentaethylenehexamine (PEHA) is as high as -1.01 × 10(13) cm(-2), which reduces the sheet resistance of graphene by up to ∼400% compared to pristine graphene. Our study suggests that the branched structure of the dopant molecules is another important factor that determines the actual doping degree of graphene.

Download full-text PDF

Source
http://dx.doi.org/10.1039/c5cp03196fDOI Listing

Publication Analysis

Top Keywords

n-type doping
8
high-molecular-weight ethylene
8
ethylene amines
8
doping
5
graphene
5
stable n-type
4
doping graphene
4
graphene high-molecular-weight
4
amines demonstrate
4
demonstrate stable
4

Similar Publications

Constructing a built-in electric field (BIEF) within heterostructures has emerged as a compelling strategy for advancing electrocatalytic oxygen evolution reaction (OER) performance. Herein, the p-n type nanosheet array heterojunction NiP-NCDs-Co(OH)-NF are successfully prepared. The variation in interaction affinity between nitrogen within N-doped carbon dots (NCDs) and Ni/Co induces charge redistribution between Co and Ni in the NiP-NCDs-Co(OH)-NF-3 heterostructure, thereby enhancing the intensity of the BIEF, facilitating electron transfer, and markedly improving OER activity.

View Article and Find Full Text PDF

Complementary neural network circuits combining multifunctional high-performance p-type with n-type organic artificial synapses satisfy sophisticated applications such as image cognition and prosthesis control. However, implementing the dual-modal memory features that are both volatile and nonvolatile in a synaptic transistor is challenging. Herein, for the first time, we propose a single vertical n-type organic synaptic transistor (VNOST) with a novel polymeric organic mixed ionic-electronic conductor as the core channel material to achieve dual-modal synaptic learning/memory behaviors at different operating current densities via the formation of an electric double layer and the reversible ion doping.

View Article and Find Full Text PDF

Favorable Contact with Low Interfacial Resistance for n-Type TiCoSb-Based Thermoelectric Devices.

ACS Appl Mater Interfaces

January 2025

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India.

In the past decade, significant efforts have been made to develop efficient half-Heusler (HH) based thermoelectric (TE) materials. However, their practical applications remain limited due to various challenges occurring during the fabrication of TE devices, particularly the development of stable contacts with low interfacial resistance. In this study, we have made an effort to explore a stable contact material with low interfacial resistance for an n-type TiCoSb-based TE material, specifically TiNbCoSbBi as a proof of concept, using a straightforward facile synthesis route of spark plasma sintering.

View Article and Find Full Text PDF

Lattice defect engineering advances n-type PbSe thermoelectrics.

Nat Commun

January 2025

School of Chemistry and Physics, ARC Research Hub in Zero-emission Power Generation for Carbon Neutrality, and Centre for Materials Science, Queensland University of Technology, Brisbane, QLD, Australia.

Te-free thermoelectrics have garnered significant interest due to their immense thermoelectric potential and low cost. However, most Te-free thermoelectrics have relatively low performance because of the strong electrical and thermal transport conflicts and unsatisfactory compatibility of interfaces between device materials. Here, we develop lattice defect engineering through Cu doping to realize a record-high figure of merit of ~1.

View Article and Find Full Text PDF

To date, III-V semiconductor-based tandem devices with GaInP top photoabsorbers show the highest solar-to-electricity or solar-to-fuel conversion efficiencies. In photoelectrochemical (PEC) cells, however, III-V semiconductors are sensitive, in terms of photochemical stability and, therefore, require suitable functional layers for electronic and chemical passivation. GaN films are discussed as promising options for this purpose.

View Article and Find Full Text PDF

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!