Redispersion of platinum nanoparticles (Pt NPs) on ceria is an important route for catalyst regeneration and antisintering. Here, we investigate the redispersion of Pt on ceria nanoparticles with defined surface planes including cubes ({100}) and octahedra ({111}). It is observed that Pt redispersion takes place only on ceria cubes in an alternating oxidation and reduction atmosphere. A quicker alternation rate is beneficial for such redispersion. On the basis of our experimental results and understandings toward this process, we proposed that the redispersion takes place at the moment of alternation of oxidation and reduction.
Download full-text PDF |
Source |
|---|---|
| http://dx.doi.org/10.1021/jz500839u | DOI Listing |
Publication Analysis
Top Keywords
Similar Publications
Tuning the electronic structure and SMSI by integrating trimetallic sites with defective ceria for the CO reduction reaction.
Proc Natl Acad Sci U S A
January 2025
Department of Chemical Sciences, Tata Institute of Fundamental Research, Mumbai 400005, India.
Heterogeneous catalysts have emerged as a potential key for closing the carbon cycle by converting carbon dioxide (CO) into value-added chemicals. In this work, we report a highly active and stable ceria (CeO)-based electronically tuned trimetallic catalyst for CO to CO conversion. A unique distribution of electron density between the defective ceria support and the trimetallic nanoparticles (of Ni, Cu, Zn) was established by creating the strong metal support interaction (SMSI) between them.
View Article and Find Full Text PDFCu doped ceria nanoparticles- rhodamine B as a novel chemiluminescence system and its application for nitrite detection in water and food samples.
Mikrochim Acta
January 2025
Cellular and Molecular Research Center, Cellular and Molecular Research Medicine Institute, Urmia University of Medical Sciences, 5714783734, Urmia, Iran.
Fe, Ni, and Cu doped ceria nanoparticles (CeNPs) were prepared with a simple and one-pot hydrothermal synthesis method. We investigated the chemiluminescence (CL) interaction between these NPs and rhodamine B (Rh B) and found that the highest CL intensity was related to the Rh B- Cu doped CeNPs. We assigned that to the higher catalytic property of Cu doped NPs compared to the others.
View Article and Find Full Text PDFA Cerium Oxide Loaded Hyaluronic Acid Nanosystem Remits Glucose Oxidative Stress-Induced Odontoblasts Mitochondrial Apoptosis through Regulation of PGAM5 Pathway.
ACS Appl Mater Interfaces
January 2025
School and Hospital of Stomatology, Wenzhou Medical University, Wenzhou 325027, China.
Diabetes mellitus (DM) induced mitochondrial oxidative stress (OS) can lead to severe injury of dental pulp. The cerium oxide nanoparticles (CNP) have been proven to have excellent antioxidative activity. However, whether CNP can relieve dental pulp damage caused by DM and the underlying mechanisms remain unclear.
View Article and Find Full Text PDFOral Delivery of miR146a Conjugated to Cerium Oxide Nanoparticles Improves an Established T Cell-Mediated Experimental Colitis in Mice.
Pharmaceutics
December 2024
Laboratory for Fetal and Regenerative Biology, Department of Surgery, University of Arizona Tucson College of Medicine, Banner Children's at Diamond Children's Medical Center, 1656 E Mabel St, Rm 230, Tucson, AZ 85721, USA.
Dysregulated inflammation and oxidative stress are strongly implicated in the pathogenesis of inflammatory bowel disease. We have developed a novel therapeutic that targets inflammation and oxidative stress. It is comprised of microRNA-146a (miR146a)-loaded cerium oxide nanoparticles (CNPs) (CNP-miR146a).
View Article and Find Full Text PDFThe Stability Evaluation of Ceria Slurry Using Polymer Dispersants with Varying Contents for Chemical Mechanical Polishing Process.
Polymers (Basel)
December 2024
Department of Chemistry, University of Hannam, Daejeon 34430, Republic of Korea.
The chemical mechanical polishing/planarization (CMP) is essential for achieving the desired surface quality and planarity required for subsequent layers and processing steps. However, the aggregation of slurry particles caused by abrasive materials can lead to scratches, defects, increased surface roughness, degradation the quality and durability of the finished surface after milling processes during the CMP process. In this study, ceria slurry was prepared using polymer dispersant with zinc salt of ethylene acrylic acid (EAA) copolymer at different contents of 5, 6, and 7 wt% (denoted as D5, D6, and D7) to minimize particle aggregation commonly observed in CMP slurries.
View Article and Find Full Text PDFWant AI Summaries of new PubMed Abstracts delivered to your In-box?
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!