Quantum Chemical Insight into the LiF Interlayer Effects in Organic Electronics: Reactions between Al Atom and LiF Clusters.

J Phys Chem Lett

†Institution of Functional Material Chemistry, Department of Chemistry, Northeast Normal University, Changchun 130024, China.

Published: August 2015

AI Article Synopsis

  • The aluminum cathode significantly improves in performance when a thin layer of lithium fluoride (LiF) is used in organic electronic devices, although the exact mechanisms are not completely understood.
  • Previous theories suggested that the interaction of lithium from LiF with aluminum leads to beneficial doping effects, resulting in the formation of aluminum fluoride (AlF3) as a byproduct.
  • This study investigates the reactions between aluminum and different LiF cluster sizes, discovering two primary reaction pathways that release lithium and produce AlF3, while offering new insights into the impact of the LiF interlayer on electronic applications.

Article Abstract

It is well known that the aluminum cathode performs dramatically better when a thin lithium fluoride (LiF) layer inserted in organic electronic devices. The doping effect induced by the librated Li atom via the chemical reactions producing AlF3 as byproduct was previously proposed as one of possible mechanisms. However, the underlying mechanism discussion is quite complicated and not fully understood so far, although the LiF interlayer is widely used. In this paper, we perform theoretical calculations to consider the reactions between an aluminum atom and distinct LiF clusters. The reaction pathways of the Al-(LiF)n (n = 2, 4, 16) systems were discovered and the energetics were theoretically evaluated. The release of Li atom and the formation of AlF3 were found in two different chemical reaction routes. The undissociated Al-(LiF)n systems have chances to change to some structures with loosely bound electrons. Our findings about the interacted Al-(LiF)n systems reveal new insights into the LiF interlayer effects in organic electronics applications.

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Source
http://dx.doi.org/10.1021/acs.jpclett.5b01182DOI Listing

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