Strain in a silicon-on-insulator nanostructure revealed by 3D x-ray Bragg ptychography.

Sci Rep

1] European Synchrotron Radiation Facility, BP220, 38043 Grenoble, France [2] Department of Analytical Chemistry, Ghent University, Krijgslaan 281, S12, 9000 Ghent, 9000 Ghent.

Published: May 2015

Progresses in the design of well-defined electronic band structure and dedicated functionalities rely on the high control of complex architectural device nano-scaled structures. This includes the challenging accurate description of strain fields in crystalline structures, which requires non invasive and three-dimensional (3D) imaging methods. Here, we demonstrate in details how x-ray Bragg ptychography can be used to quantify in 3D a displacement field in a lithographically patterned silicon-on-insulator structure. The image of the crystalline properties, which results from the phase retrieval of a coherent intensity data set, is obtained from a well-controlled optimized process, for which all steps are detailed. These results confirm the promising perspectives of 3D Bragg ptychography for the investigation of complex nano-structured crystals in material science.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4434906PMC
http://dx.doi.org/10.1038/srep09827DOI Listing

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