We report the influences of a dot-in-a-well structure with a thin GaAs layer and the thickness of a waveguide (WG) on the lasing characteristics of InAs quantum dots (QDs) based on InP. The QD laser diodes (QDLDs) consist of seven-stacked InAs QDs separated by a 10 nm-thick InGaAsP (1.15 μm, 1.15Q-InGaAsP) layer, which is further sandwiched by a 800 nm-thick 1.15Q-lnGaAsP WG (reference QDLD). For comparison, the InAs QDs were inserted into the InGaAsP (1.35 μm, 1.35Q-InGaAsP) quantum well embedded in the 1.15Q-InGaAsP matrix at the active layer. And a 2 monolayer (ML)-thick GaAs layer was additionally introduced right before the QD layer (GDWELL-LDs). Lasing emission from the reference QDLD with only the 1.15Q-InGaAsP structure was not observed at room temperature (RT). However, the lasing emission from the GDWELL-LDs was clearly observed at the wavelength of 1.46 μm at RT under continuous-wave (CW) mode. The threshold current density of the GDWELL-LD with the 800 nm-thick InGaAsP WG was measured to be 830 A/cm2, which was lower than that of the GDWELL-LD with the 200 nm-thick WG (900 A/cm2). Also, the slope efficiency of the GDWELL-LD was significantly improved with increasing thickness of the InGaAsP WG.
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