In this study, we applied a metal catalyst etching method to fabricate a nano/microhole array on a Si substrate for application in solar cells. In addition, the surface of an undesigned area was etched because of the attachment of metal nanoparticles that is dissociated in a solution. The nano/microhole array exhibited low specular reflectance (<1%) without antireflection coating because of its rough surface. The solar spectrum related total reflection was approximately 9%. A fabricated solar cell with a 40-μm hole spacing exhibited an efficiency of 9.02%. Comparing to the solar cell made by polished Si, the external quantum efficiency for solar cell with 30 s etching time was increased by 16.7%.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4266526 | PMC |
| http://dx.doi.org/10.1186/1556-276X-9-654 | DOI Listing |
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Periodic nano/micro-hole array silicon solar cell.
Nanoscale Res Lett
December 2014
Department of Electrical Engineering, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan ; Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan ; Nanoscience and Nanotechnology Research Center, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan.
In this study, we applied a metal catalyst etching method to fabricate a nano/microhole array on a Si substrate for application in solar cells. In addition, the surface of an undesigned area was etched because of the attachment of metal nanoparticles that is dissociated in a solution. The nano/microhole array exhibited low specular reflectance (<1%) without antireflection coating because of its rough surface.
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