Flexoelectric control of defect formation and associated electronic function is demonstrated in ferroelectric BiFeO3 thin films. An intriguing, so far never demonstrated, effect of internal electric field (Eint ) on defect formation is explored by a means of flexoelectricity. Our study provides novel insight into defect engineering, as well as allows a pathway to design defect configuration and associated electronic function.
Download full-text PDF |
Source |
---|---|
http://dx.doi.org/10.1002/adma.201400654 | DOI Listing |
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!