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Memory impedance in TiO2 based metal-insulator-metal devices. | LitMetric

Memory impedance in TiO2 based metal-insulator-metal devices.

Sci Rep

1] Nano Research Group, School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, UK [2] Department of Electrical and Electronic Engineering, Imperial College London, London SW7 2AZ, UK.

Published: March 2014

AI Article Synopsis

Article Abstract

Large attention has recently been given to a novel technology named memristor, for having the potential of becoming the new electronic device standard. Yet, its manifestation as the fourth missing element is rather controversial among scientists. Here we demonstrate that TiO2-based metal-insulator-metal devices are more than just a memory-resistor. They possess resistive, capacitive and inductive components that can concurrently be programmed; essentially exhibiting a convolution of memristive, memcapacitive and meminductive effects. We show how non-zero crossing current-voltage hysteresis loops can appear and we experimentally demonstrate their frequency response as memcapacitive and meminductive effects become dominant.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC3970129PMC
http://dx.doi.org/10.1038/srep04522DOI Listing

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