Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.
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http://dx.doi.org/10.1002/adma.201301383 | DOI Listing |
Lab Chip
January 2025
NASCENT Engineering Research Center, The University of Texas at Austin, Austin, Texas 78758, USA.
Despite being a high-resolution separation technique, deterministic lateral displacement (DLD) technology is facing multiple challenges with regard to design, manufacture, and operation of pertinent devices. This work specifically aims at alleviating difficulties associated with design and manufacture of DLD chips. The process of design and production of computer-aided design (CAD) mask layout files that are typically required for computational modeling analysis, optimization, as well as for manufacturing DLD-based micro/nanofluidic chips is complex, time-consuming, and often necessitates a high level of expertise in the field.
View Article and Find Full Text PDFAdv Sci (Weinh)
January 2025
Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
The commercialization of metasurfaces is crucial for real-world applications such as wearable sensors, pigment-free color pixels, and augmented and virtual reality devices. Nanoparticle-embedded resin-based nanoimprint lithography (PER-NIL) has shown itself to be a low-cost, high-throughput manufacturing method enabling the replication of high-index nanostructures. It has been extensively integrated into the fabrication of hologram metasurfaces, metalenses, and sensors due to its procedural simplicity.
View Article and Find Full Text PDFNanotechnology
December 2024
Department of Physics (DTU Fysik), Technical University of Denmark, Fysikvej, Kgs. Lyngby, 2800, DENMARK.
Metasurface holography, capable of fully engineering the wavefronts of light in an ultra-compact manner, has emerged as a promising route for vivid imaging, data storage, and information encryption. However, the primary manufacturing method for visible metasurface holography remains limited to the expensive and low-productivity electron-beam lithography (EBL). Here, we experimentally demonstrate the polarization-insensitive visible metasurface holography fabricated by high-throughput and low-cost nanoimprint lithography (NIL).
View Article and Find Full Text PDFRecently, nanoimprinting has attracted a new round of attention in the industry due to the boom in demand for augmented reality/virtual reality (AR/VR), metalens and microlens, and even semiconductors. Slanted gratings have great application prospects in AR/VR displays because of their high efficiency in light coupling. UV-Nanoimprint lithography (UV-NIL) has been identified as one of the most feasible routes for mass manufacture of high refractive index (RI) slanted gratings.
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