We report on a wafer scale fabrication method of a three-dimensional plasmonic metamaterial with strong chiroptical response in the visible region of the electromagnetic spectrum. The system was comprised of metallic nanoparticles arranged in a helical fashion, with high degree of flexibility over the choice of the underlying material, as well as their geometrical parameters. This resulted in exquisite control over the chiroptical properties, most importantly the spectral signature of the circular dichroism. In spite of the large variability in the arrangement, as well as the size and shape of the constituent nanoparticles, the average chiro-optical response of the material remained uniform across the wafer, thus confirming the suitability of this system as a large area chiral metamaterial. By simply heating the substrate for a few minutes, the geometrical properties of the nanoparticles could be altered, thus providing an additional handle towards tailoring the spectral response of this novel material.
Download full-text PDF |
Source |
---|---|
http://dx.doi.org/10.1039/c3nr02666c | DOI Listing |
Sci Rep
January 2025
College of Mechanical Engineering, Zhejiang University of Technology, No.18, Chaowang Road, Hangzhou, 310014, Zhejiang Province, China.
To observe the chemical mechanical polishing (CMP) process at the atomic scale, reactive force field molecular dynamics (ReaxFF-MD) was employed to simulate the polishing of 6 H-SiC under three conditions: dry, pure water, and HO solution. This study examined the reactants on the surface of 6 H-SiC during the reaction in the HO solution, along with the dissociation and adsorption processes of HO and water molecules. The mechanisms for atom removal during the CMP process were elucidated.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2025
Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea.
The unique characteristics of metasurfaces to precisely control the amplitude, phase, and polarization of light within a thin, flat footprint make them a promising replacement for bulky optical components. However, fabrication methods of conventional metasurfaces have suffered from low throughput and high costs, limiting scalability and practical application. To address these challenges, an advanced fabrication technique is developed by combining deep-ultraviolet argon fluoride photolithography with wafer-scale nanotransfer printing to facilitate the scalable fabrication of metal-insulator-metal structures.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2025
School of Materials, Shenzhen Campus of Sun Yat-sen University, No. 66, Gongchang Road, Guangming District, Shenzhen, Guangdong 518107, P.R. China.
Indium (In) reduction is a hot topic in transparent conductive oxide (TCO) research. So far, most strategies have been focused on reducing the layer thickness of In-based TCO films and exploring TCOs. However, no promising industrial solution has been obtained yet.
View Article and Find Full Text PDFNat Commun
January 2025
School of Materials Science and Engineering, Peking University, Beijing, China.
In the realm of modern materials science, horizontally aligned carbon nanotube arrays stand as promising materials for the development of next-generation integrated circuits. However, their large-scale integration has been impeded by the constraints of current fabrication techniques, which struggle to achieve the necessary uniformity, density, and size control of carbon nanotube arrays. Overcoming this challenge necessitates a significant shift in fabrication approaches.
View Article and Find Full Text PDFNat Commun
January 2025
Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China.
The recently emerged remote epitaxy technique, utilizing 2D materials (mostly graphene) as interlayers between the epilayer and the substrate, enables the exfoliation of crystalline nanomembranes from the substrate, expanding the range of potential device applications. However, remote epitaxy has been so far applied to a limited range of material systems, owing to the need of stringent growth conditions to avoid graphene damaging, and has therefore remained challenging for the synthesis of oxide nanomembranes. Here, we demonstrate the remote epitaxial growth of an oxide nanomembrane (vanadium dioxide, VO) with a sub-nanometer thick amorphous interlayer, which can withstand potential sputtering-induced damage and oxidation.
View Article and Find Full Text PDFEnter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!