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Self-assembly of a halogenated molecule on oxide-passivated Cu(110). | LitMetric

Self-assembly of a halogenated molecule on oxide-passivated Cu(110).

Chem Asian J

Centre Énergie, Matériaux et Télécommunication, Institut National de la Recherche Scientifique, Université du Québec, 1650 boulevard Lionel-Boulet, Varennes, QC J3X 1S2, Canada.

Published: August 2013

AI Article Synopsis

  • - The study explores how brominated molecules self-assemble on two different copper surfaces: bare Cu(110) and oxygen-modified Cu(110)-O(2×1), under ultrahigh vacuum conditions.
  • - Scanning tunneling microscopy reveals that brominated molecules create a disordered structure on bare Cu(110), while forming a well-organized network on the oxygen-modified surface.
  • - The findings suggest that the presence of oxygen weakens the interactions between molecules and the substrate, which helps prevent the breakdown of the brominated molecules and could be useful for studying other self-assembly processes on copper surfaces.

Article Abstract

The supramolecular self-assembly of brominated molecules was investigated and compared on Cu(110) and Cu(110)-O(2×1) surfaces under ultrahigh vacuum. By using scanning tunnelling microscopy, we show that brominated molecules form a disordered structure on Cu(110), whereas a well-ordered supramolecular network is observed on the Cu(110)-O(2×1) surface. The different adsorption behaviors of these two surfaces are described in terms of weakened molecule-substrate interactions on Cu(110)-O(2×1) as opposed to bare Cu(110). The effect of oxygen-passivation is to suppress debromination and it can be a convenient approach for investigating other self-assembly processes on copper-based substrates.

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Source
http://dx.doi.org/10.1002/asia.201300283DOI Listing

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