Polarimetric characterization of bismuth thin films deposited by laser ablation.

Appl Opt

Centro de Investigaciones en Óptica, León, Guanajuato, Mexico.

Published: December 2012

AI Article Synopsis

  • A Mueller-Stokes analysis was conducted on pure bismuth thin films created using laser ablation, utilizing a polarimeter and a 632.8 nm laser to evaluate their complex refractive index from 250-1100 nm.
  • The Mueller matrix results indicate that the diattenuation and polarizance parameters are highly sensitive to factors like sample thickness and incidence angle, except at the pseudo-Brewster angle where they stabilize.
  • The findings suggest that understanding the polarization response, influenced by surface morphology changes, can aid in designing photonic bismuth-based devices for various applications.

Article Abstract

A Mueller-Stokes analysis is applied to pure bismuth thin film samples prepared by the laser ablation technique by using a polarimeter with a 632.8 nm continuum wavelength laser. The complex refractive index is determined in the range of 250-1100 nm. Results from the Mueller matrix show the high sensitivity of diattenuation and polarizance parameters as a function of the sample thickness and the incidence angle, except at the pseudo-Brewster angle, where they exhibit the same value. Results show that the knowledge of the polarimetric response, with appropriate incident polarization states, could be used to design photonic Bi-based devices for several applications. Polarization dependence is the result of changes on the surface morphology as a result of the small value of the skin depth.

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http://dx.doi.org/10.1364/AO.51.008549DOI Listing

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