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Optimized pitch button blocking for polishing high-aspect-ratio optics. | LitMetric

Optimized pitch button blocking for polishing high-aspect-ratio optics.

Appl Opt

Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94551, USA.

Published: December 2012

AI Article Synopsis

  • Pitch button blocking (PBB) uses small pitch buttons to secure thin workpieces, like optics, to a blocking plate for effective noncompliant polishing.
  • The design and optimization of PBB have been achieved through experimental and theoretical methods, focusing on the number, size, and spacing of the buttons based on a thermoelastic model.
  • The refined PBB technique has been effectively applied to workpieces ranging from 100-265 mm in size, achieving peak-to-valley heights of less than 0.1 μm after processing.

Article Abstract

Pitch button blocking (PBB), involving attaching small pitch buttons between the back of a thin workpiece (i.e., optic) and a blocking plate, enables noncompliant convergent polishing in which the workpiece stiffness and block interface strength are maintained. This process has been optimized, and practical design criteria (number, size, and spacing of pitch buttons) have been determined both experimentally and theoretically using a thermoelastic model. The optimized PBB process has been successfully implemented on 100-265 mm sized workpieces with aspect ratios up to 45, resulting in maximum peak-to-valley heights of <|0.1| μm after blocking and polishing.

Download full-text PDF

Source
http://dx.doi.org/10.1364/AO.51.008350DOI Listing

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