Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films.

Chem Commun (Camb)

Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, Beijing 100190, China.

Published: October 2012

Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.

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http://dx.doi.org/10.1039/c2cc35010fDOI Listing

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