AI Article Synopsis
- The study focuses on the precise patterning of colloidal quantum dots, which is crucial for their use in technologies related to light manipulation, like photonics and plasmonics.
- Various advanced techniques for patterning quantum dots, including polymer composites and printing methods, have been explored.
- The authors introduce a straightforward technique that allows the creation of highly defined patterns on surfaces, achieving very fine lines and showcasing its application in creating a surface plasmon launcher.
Article Abstract
The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing and microcontact printing of quantum dots have been recently developed. Herein, we present a simple method of patterning colloidal quantum dots for photonic nanostructures such as straight lines, rings and dot patterns either on transparent or metallic substrates. Sub-10 nm width of the patterned line could be achieved with a well-defined sidewall profile. Using this method, we demonstrate a surface plasmon launcher from a quantum dot cluster in the visible spectrum.
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| http://dx.doi.org/10.1088/0957-4484/23/35/355302 | DOI Listing |
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