In Qiao's previous report, only star polymers with T(g) (glass transition temperature) below 48°C were found forming homogeneous honeycomb coatings on the nonplanar substrates. The polymers with high T(g) are believed not able to duplicate nonplanar substrate due to their brittleness. This article presents a comprehensive study on the construction of macroporous polymeric films on various nonplanar substrates with static breath figure (BF) technique, using linear polymers with high T(g). Two kinds of linear polymers with high T(g), polystyrene-b-poly(acrylic acid) and polystyrene without polar end groups, are employed to prepare 3-dimensional macroporous films on different nonplanar substrates. Scanning electronic microscopy views on the side wall in addition to views in-plane prove that polymer films with BF array perfectly replicated the surface features of these substrates. The formation processes of macropores on these substrates are analyzed in detail, and it demonstrates that neither molecular topography nor T(g) of polymers is the critical factor contouring nonplanar substrate. A new hypothesis involving polymer plasticization and conformation during the solvent evaporation is formulated.
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http://dx.doi.org/10.1016/j.jcis.2012.04.072 | DOI Listing |
Adv Mater
December 2024
Tianjin Key Lab for Rare Earth Materials and Applications, Center for Rare Earth and Inorganic Functional Materials, School of Materials Science and Engineering, National Institute for Advanced Materials, Nankai University, Tianjin, 300350, China.
Currently, there are still obstacles to rationally designing the ligand fields to activate rare-earth (RE) elements with satisfactory intrinsic electrocatalytic reactivity. Herein, axial coordination strategies and nanostructure design are applied for the construction of La single atoms (La-Cl SAs/NHPC) with satisfactory oxygen reduction reaction (ORR) activity. The nontrivial LaNCl motifs configuration and the hierarchical porous carbon substrate that facilitates maximized metal atom utilization ensure high half-wave potential (0.
View Article and Find Full Text PDFSmall
December 2024
Institute of Micro- and Nanotechnologies MacroNano, Microsystems Technology Group, Technische Universität Ilmenau, Max-Planck-Ring 12, 98693, Ilmenau, Germany.
3D printing down to the nanoscale remains a significant challenge. In this paper, the study explores the use of scanning probes that emit low-energy electrons (<100 eV) coupled with the localized injection and electron-induced decomposition of precursor molecules, for the precise localized deposition of 3D nanostructures. The experiments are performed inside the chamber of a scanning electron microscope (SEM), enabling the use of the in-built gas injector system (GIS) with gaseous naphthalene precursor for carbon deposition, as well as immediate inspection of the deposits by SEM.
View Article and Find Full Text PDFScience
December 2024
DNA Processing Machines Laboratory, Francis Crick Institute, London, UK.
Maintaining genome integrity is an essential and challenging process. RAD51 recombinase, the central player of several crucial processes in repairing DNA and protecting genome integrity, forms filaments on DNA, which are tightly regulated. One of these RAD51 regulators is FIGNL1, that prevents persistent RAD51 foci without or after DNA damage and genotoxic chromatin association in cells.
View Article and Find Full Text PDFMaterials (Basel)
November 2024
Department of Materials Science and Engineering, Pukyong National University (PKNU), Busan 48513, Republic of Korea.
Nano-transfer printing (nTP) has emerged as an effective method for fabricating three-dimensional (3D) nanopatterns on both flat and non-planar substrates. However, most transfer-printed 3D patterns tend to exhibit non-discrete and/or non-porous structures, limiting their application in high-precision nanofabrication. In this study, we introduce a simple and versatile approach to produce highly ordered, porous 3D cross-bar arrays through precise control of the nTP process parameters.
View Article and Find Full Text PDFAdv Mater
November 2024
College of Mechanical and Vehicle Engineering, Hunan University, Changsha, 410082, P. R. China.
Lithography is critical in micro- and nanofabrication processes, enabling the development of integrated circuits, semiconductor devices, and various advanced electronic and photonic systems. However, there are challenges related to sustainability, efficiency, and yield, as well as compatibility with transient electronics. This work introduces a sustainable lithography paradigm employing mechanically peelable resists compatible with existing cleanroom processes.
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