AI Article Synopsis
- Researchers developed an EUV source using a high-power Ti:sapphire laser oscillator that operates at a repetition rate of 9.4 MHz.
- The setup allows for extremely short laser pulses, with durations as brief as 17 femtoseconds and pulse energies of 1 microjoule.
- By focusing the laser in a second intracavity position, they generated high intensities over 10¹⁴ W/cm², enabling high harmonic generation in a Xenon gas jet.
Article Abstract
We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 µJ pulse energy. In a second intracavity focus, intensity more than 10¹⁴ W/cm² has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet.
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| http://dx.doi.org/10.1364/OE.20.006185 | DOI Listing |
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