AI Article Synopsis
- Photolithography is vital for mass patterning in semiconductor and data storage, but current superlenses struggle with profile depth for effective use in this field.
- Recent experiments have achieved sub-50 nm resolution in nanophotolithography using a smooth silver superlens, demonstrating advancements in three-dimensional nanopatterning.
- Integrating superlens-based techniques with traditional UV photolithography could create a cost-effective and efficient method for scalable nanopatterning.
Article Abstract
Photolithography is the technology of choice for mass patterning in semiconductor and data storage industries. Superlenses have demonstrated the capability of subdiffraction-limit imaging and been envisioned as a promising technology for potential nanophotolithography. Unfortunately, subdiffraction-limit patterns generated by current superlenses exhibited poor profile depth far below the requirement for photolithography. Here, we report an experimental demonstration of sub-50 nm resolution nanophotolithography via a smooth silver superlens with a high aspect profile of ~45 nm, as well as grayscale subdiffraction-limit three-dimensional nanopatterning. Theoretical analysis and simulation show that smooth interfaces play a critical role. Superlens-based lithography can be integrated with conventional UV photolithography systems to endow them with the capability of nanophotolithography, which could provide a cost-effective approach for large scale and rapid nanopatterning.
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| http://dx.doi.org/10.1021/nl2044088 | DOI Listing |
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