AI Article Synopsis
- The new process uses traditional lithography and selective wet-etching of MgO to create a high-temperature hard mask.
- The hard mask can withstand standard nano-lithography methods and heat treatments over 1000 °C.
- This technique enhances ferroelectric thin-film capacitors by producing temperature-stable contacts that exhibit low leakage, better fatigue properties, and improved stability at high temperatures.
Article Abstract
Illustration of a new high-temperature hard-mask process based on traditional lithography and selective wet-etching of MgO. The hard mask is compatible with standard nano-lithography techniques and heat treatments in excess of 1000 °C. Here, this technique is applied to produce temperature-stable contacts that give rise to low leakage, improved fatigue properties, and excellent high-temperature stability in ferroelectric thin-film capacitors.
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| http://dx.doi.org/10.1002/adma.201104697 | DOI Listing |
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