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Enhanced 355-nm generation using a simple method to compensate for walk-off loss. | LitMetric

Enhanced 355-nm generation using a simple method to compensate for walk-off loss.

Opt Express

Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Buk-gu, Gwangju, South Korea.

Published: January 2012

We theoretically and experimentally investigated a novel walk-off-compensation method for efficient ultraviolet beam generation. Through theoretical investigation, we described in detail how the power of a generated UV beam can be enhanced by the method; thus, we obtained a brief expression for the output power which has a prediction error of about 30%. In addition, we found that the beam quality can also be enhanced using this method. Through experiments using an alpha barium borate crystal as a walk-off compensator, we found that the power of the generated ultraviolet beam increased 1.9 times.

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Source
http://dx.doi.org/10.1364/OE.20.000941DOI Listing

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