Interaction of NO2 with TiO2 surface under UV irradiation: products study.

J Phys Chem A

Institut de Combustion, Aérothermique, Réactivité et Environnement (ICARE), CNRS, 45071 Orléans Cedex 2, France.

Published: February 2012

The interaction of NO(2) with TiO(2) solid films was studied under UV irradiation using a low pressure flow reactor (1-10 Torr) combined with a modulated molecular beam mass spectrometer for monitoring of the gaseous species involved. HONO, NO, and N(2)O were observed as the products of the reactive uptake of NO(2) to the illuminated TiO(2) surface with the sum of their yields corresponding nearly to 100% of the nitrogen mass balance. The yield of the products was measured as a function of different parameters such as irradiance intensity, relative humidity (RH), temperature, and concentrations of NO(2) and O(2). The yield of N(2)O was found to be 0.15 ± 0.05 independent of the experimental conditions. The distribution of the products between NO and HONO was found to be independent of temperature in the range T = 280-320 K and was governed by relative humidity: increase in RH led to lower NO and higher HONO yield, with a maximum of nearly 65% reached at ~5% RH. Presence of molecular oxygen was shown to shift the HONO/NO distribution to HONO at low RH (<5%) with no effect at higher RH where the HONO yield is maximum. The following values for the yield of the products of NO(2) interaction with pure TiO(2) under real atmospheric conditions can be recommended from this work: 0.65 ± 0.10, 0.05 ± 0.05, and 0.15 ± 0.05 for HONO, NO, and N(2)O, respectively. The mechanism of the photoinitiated heterogeneous reaction and possible atmospheric implications of the obtained results are discussed.

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http://dx.doi.org/10.1021/jp210078bDOI Listing

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