Pseudoelastic deformation during nanoscale adhesive contact formation.

Phys Rev Lett

Department of Materials Engineering, Technion - Israel Institute of Technology, 32000 Haifa, Israel.

Published: August 2011

Molecular dynamics simulations are employed to demonstrate that adhesive contact formation through classical jump to contact is mediated by extensive dislocation activity in metallic nanoparticles. The dislocations generated during jump to contact are completely annihilated by the completion of the adhesive contact, leaving the nanoparticles dislocation-free. This rapid and efficient jump to contact process is pseudoelastic, rather than purely elastic or plastic.

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http://dx.doi.org/10.1103/PhysRevLett.107.096101DOI Listing

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