Voltage-pulse-induced electromigration.

Nanotechnology

NTT Basic Research Laboratories, NTT Corporation, 3-1, Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.

Published: April 2008

We propose and demonstrate a voltage-pulse-induced electromigration technique, in which electromigration in a gold nanowire is induced for a short period of about 10 µs by applying a voltage pulse. A local temperature analysis and a controlled electromigration experiment in the presence of voltage pulses indicate successful control of this voltage-pulsed-induced electromigration. We also measured the current-voltage characteristics of the nanowire after the application of each single voltage pulse to investigate the stochastic behavior of electromigration. A pulse duration shorter than the thermal relaxation time of the nanowire would allow us to separately control the local temperature and driving force for electromigration.

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Source
http://dx.doi.org/10.1088/0957-4484/19/14/145709DOI Listing

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