An easy and cost-effective method to reproducibly fabricate nanogaps over a large area is introduced. Gold is evaporated on low-aspect-ratio polydimethylsiloxane (PDMS) stamps at an angle of 60°. Afterwards, the stamp is brought into contact with a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to 3 mm s(-1), resulting in the fabrication of nanogaps between two gold electrodes. The fabrication of insulating nanogaps with a width down to 50 nm is demonstrated.
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| http://dx.doi.org/10.1002/smll.201100413 | DOI Listing |
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