In an aim to create a "sharp" molecular knife, we have studied site-specific fragmentation caused by Si:2p core photoionization of bridged trihalosilyltrimethylsilyl molecules in the vapor phase. Highly site-specific bond dissociation has been found to occur around the core-ionized Si site in some of the molecules studied. The site specificity in fragmentation and the 2p binding energy difference between the two Si sites depend in similar ways on the intersite bridge and the electronegativities of the included halogen atoms. The present experimental and computational results show that for efficient "cutting" the following conditions for the two atomic sites to be separated by the knife should be satisfied. First, the sites should be located far from each other and connected by a chain of saturated bonds so that intersite electron migration can be reduced. Second, the chemical environments of the atomic sites should be as different as possible.
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http://dx.doi.org/10.1021/jp203664r | DOI Listing |
J Phys Condens Matter
May 2018
Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan.
Ultramicroscopy
December 2015
Peter Grünberg Institute (PGI-6) and JARA-FIT, Research Center Jülich, D-52425 Jülich, Germany.
Using soft X-ray photoelectron emission microscopy (XPEEM), complemented by scanning Auger microscopy (SAM) and scanning capacitance microscopy, we have quantitatively studied the incorporation of silicon and band bending at the surface (m-facet) of an individual, highly conductive Si-doped GaN micro-wires (Tchoulfian et al., Applied Physics Letters 102 (12), 2013). Electrically active n-dopants Si atoms in Ga interstitial sites are detected as nitride bonding states in the high-resolution Si2p core level spectra, and represent only a small fraction (<10%) of the overall Si surface concentration measured by SAM.
View Article and Find Full Text PDFJ Chem Phys
October 2011
Department of Physics, National Cheng Kung University, Tainan 70101, Taiwan.
Continuous-time core-level photon-stimulated desorption (PSD) spectroscopy was used to study the soft x-ray-induced reactions of CF(3)Br molecules adsorbed on Si(111)-7×7 near the Si(2p) edge (98-110 eV). The monochromatic synchrotron radiation was employed as a soft x-ray light source in the photon-induced reactions and also as a probe for investigating the produced fluorination states of the bonding surface Si atom in the positive-ion PSD spectroscopy. Several different surface coverages were investigated.
View Article and Find Full Text PDFJ Phys Chem B
July 2007
Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Strasse 9, 12489 Berlin, Germany.
The irradiation-induced reduction of electrochemically grafted nitrobenzene films on Si(111) was monitored by high-resolution photoelectron spectroscopy. The experiments were performed using synchrotron soft X-ray irradiation at the BESSY II synchrotron facility. The evolution of different chemical species was monitored as a function of time.
View Article and Find Full Text PDFJ Colloid Interface Sci
September 2004
Instituto de Catálisis y Petroleoquímica, CSIC, Marie Curie s/n, Cantoblanco, 28049 Madrid, Spain.
A commercial mesoporous silica (Grace Davison) was chemically grafted with trimethylsilyl chloride (TMSCl) and hexamethyldisilanaze (HMDS). The silylation process brought about some reduction in the specific BET area, the pore volume, and the pore sizes of the samples. Thermogravimetric studies of the silylated samples revealed that the grafting process is kinetically controlled at short reaction times.
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