AI Article Synopsis
- Aluminum nitride films were created using dual reactive magnetron sputtering with alternating current.
- The study examined how varying nitrogen flow and working pressures affected properties like refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of the films.
- Optimal results showed that at the right nitrogen flow rate and lower working pressure, the films exhibited a high refractive index, low extinction coefficient, and minimal residual stress.
Article Abstract
Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.
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| http://dx.doi.org/10.1364/AO.50.001945 | DOI Listing |
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