Scattering resulting from interface imperfections critically affects the image contrast and optical throughput of multilayer coatings for 13.5 nm. To investigate the scattering mechanisms, at-wavelength scattering measurements in combination with atomic force microscopy are analyzed for an in-depth characterization of the roughness properties. The different impacts of substrate finish and intrinsic thin film roughness on the scattering distribution are separated and analyzed in detail. Furthermore, a novel approach to characterize the roughness of large extreme ultraviolet substrates is presented, based on light scattering measurements at 442 nm.
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| http://dx.doi.org/10.1364/AO.50.00C148 | DOI Listing |
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