Direct nanopatterning of silsesquioxane/poly(ethylene glycol) blends with high stability and nonfouling properties.

A free-radical-polymerizable SSQ/PEG blend with direct patternability has been proposed as an ideal nonfouling material for nanostructure-based biomedical applications. Cured SSQ/PEG networks show an UV transparency of >90% at 365 nm, high resistance to organic/aqueous solutions, hydrophilicity and Young's moduli of 1.898-2.815 GPa. SSQ/PEG patterns with 25-nm linewidths, 25-nm spacing, and an aspect ratio of 4:1 were directly fabricated on transparent substrates by UV embossing, and cured SSQ/PEG networks with long-term stability under chemical, thermal, and biological stress showed strong resistance to the nonspecific adsorption of biomolecules. These characteristics may offer a new strategy for the development of a number of medical nanodevice applications such as labs-on-a-chip.