AI Article Synopsis
- A new technique called ice lithography (IL) is successfully used to create nanoscale devices inside a modified scanning electron microscope (SEM).
- This method utilizes a water ice film as a resist for electron beam lithography, simplifying the fabrication process and allowing for safer imaging of sensitive nanostructures like carbon nanotubes.
- IL enables the creation of high-quality carbon nanotube field effect transistors, improving their trans-conductance properties without the issues of degradation and contamination found in traditional methods.
Article Abstract
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show that labile nanostructures such as carbon nanotubes can be safely imaged in an SEM when coated in ice. The ice film is patterned at high e-beam intensity and serves as a mask for lift-off without the device degradation and contamination associated with e-beam imaging and polymer resist residues. We demonstrate the IL preparation of carbon nanotube field effect transistors with high-quality trans-conductance properties.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC3072455 | PMC |
| http://dx.doi.org/10.1021/nl1032815 | DOI Listing |
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