Nanocontact electrification through forced delamination of dielectric interfaces.

ACS Nano

Department of Electrical and Computer Engineering, University of Minnesota, 200 Union Street SE, Minneapolis, Minnesota 55455, USA.

Published: December 2010

This article reports patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface-functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO(2)). Forced delamination and cleavage of the interface yields a well-defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air, leading to strong long-range adhesive forces and force-distance curves, which are recorded over macroscopic distances. The process is applied to fabricate charge-patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors.

Download full-text PDF

Source
http://dx.doi.org/10.1021/nn1016692DOI Listing

Publication Analysis

Top Keywords

nanocontact electrification
8
forced delamination
8
electrification forced
4
delamination dielectric
4
dielectric interfaces
4
interfaces article
4
article reports
4
reports patterned
4
patterned transfer
4
transfer charge
4

Similar Publications

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!