Ti(1-x)Al(x)N metastable films were synthesized by reactive magnetron co-sputtering with different Ti to Al ratios. XRD studies showed that as-deposited films were crystalline for concentrations of Al (35, 40, 55 and 64%) and become amorphous at 81% Al. These films were annealed at 1073 K to study the phase separation. Films up to 55% Al did not show any phase separation after annealing. But films with 64% Al splits into c-TiAIN and c-AIN, whereas films with 81% Al split into cubic-TiN and hex-AIN. Distribution of crystallites and their size were analyzed by TEM. High density of crystallites with dimensions between 3-11 nm was dispersed in amorphous matrix for 64% Al films. Nanoindentation technique was used to determine the mechanical properties of these films without substrate effect. Maximum hardness obtained for as deposited and annealed films (64% Al) were 35 GPa and 38 GPa, respectively.
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