The hexagonally arranged close-packed concave nanotexture of the master surface of nanoporous alumina has been imprinted several times on aluminum films and gold films by thermal evaporation and on polystyrene films by spin coating. The degradation of the nanotextures with replica pattern transfer has been monitored by measuring the topology and the wettability of duplicated films. The trough-to-crest height of the topography decreases while the wettability of the nanotexture increases significantly as replication goes on. Air fractions calculated with measured water contact angles decrease substantially with replication although they also depend strongly on the materials and the shapes of duplicating nanotextures.
Download full-text PDF |
Source |
---|---|
http://dx.doi.org/10.1016/j.jcis.2009.07.032 | DOI Listing |
J Colloid Interface Sci
December 2024
Faculty of Printing, Packaging Engineering and Digital Media Technology, Xi'an, University of Technology, Xi'an 710048, PR China.
The use of toxic resists and complex procedures has impeded the resolution and quality of micro/nanofabrication on virtually arbitrary substrates via photolithography. To fabricate a precise and high-resolution pattern, a sericin nanofilm-based coating was developed by reducing disulfide bonds and subsequently assembling sericin protein. Upon exposure to ultraviolet (UV) light, intermolecular amide bonds in sericin are cleaved through the action of a reducing agent, allowing the reduced sericin (rSer) coating to exhibit the functional ability to generate diverse geometric micro/nanopatterns through photomask-governed photolithography.
View Article and Find Full Text PDFMaterials (Basel)
November 2024
Department of Materials Science and Engineering, Pukyong National University (PKNU), Busan 48513, Republic of Korea.
Nano-transfer printing (nTP) has emerged as an effective method for fabricating three-dimensional (3D) nanopatterns on both flat and non-planar substrates. However, most transfer-printed 3D patterns tend to exhibit non-discrete and/or non-porous structures, limiting their application in high-precision nanofabrication. In this study, we introduce a simple and versatile approach to produce highly ordered, porous 3D cross-bar arrays through precise control of the nTP process parameters.
View Article and Find Full Text PDFAs a basic component of the versatile semiconductor devices, metal oxides play a critical role in modern electronic information industry. However, ultra-high precision nanopatterning of metal oxides often involves multi-step lithography and transfer process, which is time-consuming and costly. Here, we report a strategy, using metal-organic compounds as solid precursor photoresist for multi-photon lithography and post-sintering, to realize ultra-high precision additive manufacturing of metal oxides.
View Article and Find Full Text PDFACS Nano
August 2024
Aix-Marseille Univ, CNRS, CINaM, Marseille 13288, France.
The advent of metasurfaces has revolutionized the design of optical instruments, and recent advancements in fabrication techniques are further accelerating their practical applications. However, conventional top-down fabrication of intricate nanostructures proves to be expensive and time-consuming, posing challenges for large-scale production. Here, we propose a cost-effective bottom-up approach to create nanostructure arrays with arbitrarily complex meta-atoms displaying single nanoparticle lateral resolution over submillimeter areas, minimizing the need for advanced and high-cost nanofabrication equipment.
View Article and Find Full Text PDFSmall
December 2024
State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
2D materials with atomically thin nature are promising to develop scaled transistors and enable the extreme miniaturization of electronic components. However, batch manufacturing of top-gate 2D transistors remains a challenge since gate dielectrics or gate electrodes transferred from 2D material easily peel away as gate pitch decreases to the nanometer scale during lift-off processes. In this study, an oxidation-assisted etching technique is developed for batch manufacturing of nanopatterned high-κ/metal gate (HKMG) stacks on 2D materials.
View Article and Find Full Text PDFEnter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!