An ellipsometric data acquisition method is introduced to measure the optical properties of sample. It is based on a microellipsometer hardware layout integrated a high numerical aperture objective lens, which is aligned in the normal direction of sample surface. This technique enables to achieve ellipsometric data at multiple incident angle with a sub-mum probe beam size, moreover real-time measurement is possible due to no moving parts. The experimental results of different SiO(2) thin film are demonstrated, also calibration technique is described.
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| http://dx.doi.org/10.1364/oe.15.018056 | DOI Listing |
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