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Ab initio and DFT studies of the thermal rearrangement of trimethylsilyl(methyl)silylene: remarkable rearrangements of silicon intermediates. | LitMetric

AI Article Synopsis

  • The study focuses on the rearrangement of trimethylsilyl(methyl)silylene, building on foundational research from Wulff et al. in 1978.
  • Using MP2 and DFT methods, the researchers analyzed thermal reaction pathways, detailing the structures and energies of different silicon species involved in the process.
  • Their theoretical predictions about product ratios match well with experimental observations, confirming the accuracy of the calculated Gibbs free energy changes.

Article Abstract

A reaction scheme for the rearrangement of trimethylsilyl(methyl)silylene (Me3Si-Si-Me) discovered in a pioneering work of organosilicon chemistry (Wulff et al., J Am Chem Soc 1978, 100, 6236) was studied by the MP2 and DFT methods. We report a thermal reaction scheme for the rearrangement of Me3Si-Si-Me with the structures and energies of various silicon species along the isomerization paths, that can account for the experimentally found product ratio. The experimental product ratio is in good agreement with the theoretical one derived from the Gibbs free energy changes calculated in the present study.

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http://dx.doi.org/10.1002/jcc.21254DOI Listing

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