Modification of films containing Si nanocrystallites embedded in SiO2 by irradiation with high-energy ions was found to induce peaks in their low-frequency capacitance-voltage characteristics. Considering the nanocrystallite spatial distribution that follows the ion tracks we interpret these peaks as due to the charge transfer along these tracks, similar to the process that was reported previously for two-dimensional arrays of such crystallites. The ion irradiation of the above three-dimensional system appears to be useful then for the fabrication of nanostructures, which have also the properties of low-dimensional arrays.
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| http://dx.doi.org/10.1088/0957-4484/20/18/185401 | DOI Listing |
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