We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.
Download full-text PDF |
Source |
|---|---|
| http://dx.doi.org/10.1364/oe.3.000280 | DOI Listing |
Publication Analysis
Top Keywords
lensless optical
8
optical lithography
8
energy flow
4
flow light-coupling
4
light-coupling masks
4
masks lensless
4
lithography illustrate
4
illustrate propagation
4
propagation light
4
light type
4
Similar Publications
Want AI Summaries of new PubMed Abstracts delivered to your In-box?
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!