Electron-beam-induced deposition allows the creation of three-dimensional nanodevices within a scanning electron microscope. Typically the dimensions of the fabricated structure are from 20 nm to several micrometers. Until now the record for the smallest deposited feature in an SEM was 3.5 nm, measured by an indirect method. We have achieved a nanodot having a full width half-maximum of 2.8 +/- 0.3 nm, measured directly in the same microscope after deposition.
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- Measuring the properties of these free-standing nanostructures is challenging due to potential interference from the measurement equipment.
- The paper introduces operational micro-electromechanical system (opMEMS) bridges, which are advanced 3D structures that allow for accurate measurement of these nanostructures' properties, such as resistance, without interference.
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