Plasma-assisted selective non-catalytic reduction (SNCR) has been investigated to clarify which species generated by the plasma play a crucial role in NO reduction. We find that the presence of O(2) is indispensable and only H(2) is observed to be a stable product by dielectric barrier discharge (DBD) of NH(3). As the extent of NH(3) decomposition by DBD increases, the commencement temperature of SNCR processes is lowered and the working temperature window is widened. This propensity may be attributed to the chemical reaction of H(2) with O(2) to generate OH and H radicals which make it possible to yield NH(2) radicals even at low temperature.
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