Block copolymer thin films can be used as soft templates for a wide range of surfaces where large area patterns of nanoscale features are desired. The cylindrical domains of acid-sensitive, self-assembled monolayers of polystyrene-poly(2-vinylpyridine) block copolymers on silicon surfaces were utilized as structural elements for the production of parallel metal nanowires. Metal ion loading of the P2VP block with simple aqueous solutions of anionic metal complexes is accomplished via protonation of this basic block, rendering it cationic; electrostatic attraction leads to a high local concentration of metal complexes within the protonated P2VP domain. A subsequent brief plasma treatment simultaneously removes the polymer and produces metallic nanowires. The morphology of the patterns can modulated by controlling solution concentration, deposition time, and molecular weight of the block copolymers, as well as other factors. Horizontal metallic nanoarrays can be aligned on e-beam lithographically defined silicon substrates within different shapes, via graphoepitaxy. This method is highly versatile as the procedures to manipulate nanowire composition, dimension, spacing, and orientation are straightforward and based upon efficient aqueous inorganic chemistry.
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