300 mm reference wafer fabrication by using direct laser lithography.

Rev Sci Instrum

Space Optics Research Center, Korea Research Institute of Standards and Science, Daejeon 305-340, Republic of Korea.

Published: October 2008

We propose a new method based on direct laser lithography to fabricate reference chromium patterns on a silicon wafer. Our method is able to fabricate a maximum 360-mm-diameter pattern with 651-nm-position uncertainty. The minimum pattern size is about 0.8 microm (linewidth value) and the maximum available height of the pattern is slightly over 400 nm.

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http://dx.doi.org/10.1063/1.2999827DOI Listing

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