Surface Plasmon Polaritons (SPPs) have been explored for a multitude of applications including sub-wavelength lithography, data storage, microscopy and photonics. In this paper, we report the use of SPPs for nanomachining silicon in massively parallel fashion. A Q-switched Nd:YAG laser beam was impinged on gold-thin film deposited, porous alumina membrane (PAM) that contains periodic 2-D array of thousands of nano-holes. The silicon substrate was placed in close proximity with PAM. The formation of SPPs and their coherent interference at the exit of PAM holes created strong nanoscale electrical fields which in turn produced 50-70 nm diameter holes in silicon.
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http://dx.doi.org/10.1166/jnn.2008.318 | DOI Listing |
Materials (Basel)
February 2023
Optical Sciences Centre and Australian Research Council (ARC) Industrial Transformation Training Centre in Surface Engineering for Advanced Materials (SEAM), Swinburne University of Technology, Hawthorn, VIC 3122, Australia.
Ultra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ∼400 nm nano-holes in a Cr etch mask that was tens-of-nm thick. The ablation threshold was found to be 2.3 nJ/pulse, double that of plain silicon.
View Article and Find Full Text PDFLight Sci Appl
December 2022
Department of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL, UK.
In semiconductor and data storage device manufacturing, it is desirable to produce feature sizes less than 30 nm with a high depth-to-width aspect ratio on the target material rapidly at a low cost. However, optical diffraction limits the smallest focused laser beam diameter to around half of the laser wavelength (λ/2). The existing approach to achieving nanoscale fabrication is mainly based on costly extreme ultraviolet (EUV) technology operating within the diffraction limit.
View Article and Find Full Text PDFWe report a new physical mechanism for simultaneous tuning of quality factors, spectral responses, and field distributions in photonic crystal slabs through removal of polarization mode degeneracy using a lattice of elliptical nano-holes. The quality factors in these structures can become higher than those obtained with much smaller circular nano-holes. Furthermore, the modes can be superimposed by either rotating or morphing the elliptical nano-holes into a corrugated grating.
View Article and Find Full Text PDFOpt Express
September 2008
Department University of Tennessee Space Institute, Tullahoma, TN 37388, USA.
Use of high numerical aperture focusing with negative longitudinal spherical aberration is shown to enable deep (> microm), high aspect ratio, nano-scale-width holes to be machined into the surface of a fused-silica (SiO(2)) substrate with single pulses from a 200 fs, 4 microJ Ti-Sapphire laser source. The depths of the nano-holes are characterized by use of a non-destructive acetate replication technique and are confirmed by imaging of sectioned samples with a dual focused ion beam/scanning electron microscope.
View Article and Find Full Text PDFJ Nanosci Nanotechnol
April 2008
Department of Mechanical Engineering, Laboratory for Lasers, MEMS and Nanotechnology, Iowa State University, Ames, IA 50011, USA.
Surface Plasmon Polaritons (SPPs) have been explored for a multitude of applications including sub-wavelength lithography, data storage, microscopy and photonics. In this paper, we report the use of SPPs for nanomachining silicon in massively parallel fashion. A Q-switched Nd:YAG laser beam was impinged on gold-thin film deposited, porous alumina membrane (PAM) that contains periodic 2-D array of thousands of nano-holes.
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