We report substantial improvement of the field emission properties from aligned carbon nanotubes grown on aligned carbon nanofibres by a two-stage plasma enhanced chemical vapour deposition (PECVD) process. The threshold field decreased from 15.0 to 3.6 V/microm after the secondary growth. The field enhancement factor increased from 240 to 1480. This technique allows for superior emission of electrons for carbon nanotube/nanofibre arrays grown directly on highly doped silicon for direct integration in large area displays.
Download full-text PDF |
Source |
---|---|
http://dx.doi.org/10.1166/jnn.2008.069 | DOI Listing |
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!