Inverse design for phase mask lithography.

Opt Express

Department of Materials Science and Engineering and the Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, Illinois 61801, USA.

Published: January 2008

We have developed a method for designing the diffractive optics used in phase mask lithography. Genetic algorithms were used to inverse-design a grating's relief profile and associated exposure conditions so that desired periodic structures are formed. An experimentally promising grating designed to produce helices is demonstrated.

Download full-text PDF

Source
http://dx.doi.org/10.1364/oe.16.000663DOI Listing

Publication Analysis

Top Keywords

phase mask
8
mask lithography
8
inverse design
4
design phase
4
lithography developed
4
developed method
4
method designing
4
designing diffractive
4
diffractive optics
4
optics phase
4

Similar Publications

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!