AI Article Synopsis

  • Researchers have identified squalene monohydroperoxide (SQ-OOH) as a key product formed in human forehead skin, indicating squalene might be the main lipid affected by oxidative stress, especially from sun exposure.
  • They developed a new analytical method to distinguish between different isomers of SQ-OOH using advanced mass spectrometry techniques, which allowed for sensitive detection of these compounds.
  • The study found that while the baseline concentration of SQ-OOH isomers in forehead skin was around 956 micrograms per gram of lipids, this concentration significantly increased to 2,760 micrograms after just three hours of sun exposure, highlighting the potential link between SQ-OOH and skin disorders related to oxidative damage

Article Abstract

We previously discovered that squalene monohydroperoxide (SQ-OOH) was produced on human forehead skin and suggested that skin squalene (SQ) may be the principal target lipid for oxidative stress (e.g., sunlight exposure). Because of its six double bonds, SQ peroxidation can yield various positional hydroperoxide isomers. However, the structural characterization of skin SQ-OOH isomers has never been reported. Here, we prepared pure SQ-OOH isomers and developed an analytical method for SQ-OOH isomers using a quadrupole/linear ion-trap mass spectrometer (QTRAP) MS/MS system. Collision-induced dissociation produced specific fragment ions for each SQ-OOH isomer, which permitted discrimination between SQ-OOH isomers by multiple reaction monitoring (MRM). When lipid extract from human forehead skin was subjected to LC-MS/MS with MRM, individual SQ-OOH isomers could be separated and detected with a sensitivity of 0.05 ng/injection. The total concentration of SQ-OOH isomers in forehead skin was approximately 956 microg/g skin lipids, but it increased up to 2,760 microg/g skin lipids after 3 h of sunlight exposure. The LC-MS/MS method was useful for investigating the peroxidation mechanisms of SQ as well as SQ-OOH-mediated skin disorders.

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Source
http://dx.doi.org/10.1194/jlr.D700016-JLR200DOI Listing

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