AI Article Synopsis
- Trimethoxy-silanes (1 and 2) are used to create photopatternable siloxane-based monolayers, which can be activated by UV light to generate reactive hydroxyl-terminals without compromising film quality.
- Detailed studies on the new monolayers utilize various physicochemical techniques, including spectroscopy and microscopy, to analyze their properties and microstructure changes after exposure to light.
- AFM-force spectroscopy reveals the hydrogen-bond energy in photodeprotected monolayers, while SEM shows that treated monolayers form precise ZnO features around 2 micrometers in size.
Article Abstract
Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 +/- 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol(-1) (approximately 2 kcal mol(-1)). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt2 solutions resulted in well-defined approximately 2 microm x 2 microm features of 10 A thick ZnO layers.
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| http://dx.doi.org/10.1021/jp0517854 | DOI Listing |
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