Interfacial Behavior of n-decyl-beta-D-maltopyranoside on hydrophobic interfaces and the effect of small amounts of surface-active impurities.

J Colloid Interface Sci

Department of Chemistry, Surface Chemistry, Royal Institute of Technology, Drottning Kristinas väg 51, Stockholm, SE-100 44, Sweden.

Published: July 2002

The effect of small amounts of surface-active impurities on the interfacial properties of n-decyl-beta-D-maltopyranoside was investigated using various methods. The n-Decyl-beta-D-maltopyranoside was used both as received from Sigma (<98% by GC) and after being purified with the surfactant-purifying apparatus developed by Lunkenheimer, which removes impurities that are more surface active than the major component. Surface tension measurements demonstrate that the surface elasticity of the surfactant-loaded liquid-vapor interface increased after purification. Measurements of interactions across single foam films revealed that the purified solution formed considerably less charged and less stable films compared with the as-received sample. These results are consistent with the lower foam stability for the purified sample as determined by simple shaking experiments. The lower film stability for the purified solution was attributed to the lower double-layer force. The forces acting between spherical silanated glass surfaces across surfactant solutions were determined with the MASIF (measurement and analysis of surface interaction forces) technique. On approach, the same interactions were experienced in solutions of the as-received and purified surfactant. On the other hand, the adhesion force was lower after purification. Both for the as-received and the purified sample it was observed that the adhesion increased with increasing contact time up to a certain limit. This was explained in terms of partial pressure-induced desorption of surfactants from the disordered silane layers. Wetting experiments also indicated that the surfactants were difficult to remove completely from this surface.

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http://dx.doi.org/10.1006/jcis.2002.8386DOI Listing

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